Apparatuses, systems, and methods for ion traps

ABSTRACT

Apparatuses, systems, and methods for ion traps are described herein. One apparatus includes a number of microwave (MW) rails and a number of radio frequency (RF) rails formed with substantially parallel longitudinal axes and with substantially coplanar upper surfaces. The apparatus includes two sequences of direct current (DC) electrodes with each sequence formed to extend substantially parallel to the substantially parallel longitudinal axes of the MW rails and the RF rails. The apparatus further includes a number of through-silicon vias (TSVs) formed through a substrate of the ion trap and a trench capacitor formed in the substrate around at least one TSV.

STATEMENT OF GOVERNMENT RIGHTS

This invention was made with Government support under contract:W911NF-12-1-0605, awarded by the U.S. Army. The Government has certainrights in this invention.

TECHNICAL FIELD

The present disclosure relates to apparatuses, systems, and methods forion traps.

BACKGROUND

An ion trap can use a combination of electrical and magnetic fields tocapture one or more ions in a potential well. Ions can be trapped for anumber of purposes, which may include mass spectrometry, research,and/or controlling quantum states, for example.

Previous approaches to ion trapping may include an ion trap surroundedby a number of on-chip filter capacitors, among other on-chipcomponents, which may occupy on-chip space and/or affect visualizationor imaging of trapped ion(s).

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A illustrates a perspective view and a top view of portions of anion trap in accordance with one or more embodiments of the presentdisclosure.

FIG. 1B illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 2 illustrates a perspective view of a through-silicon via (TSV) anda trench capacitor of an ion trap in accordance with one or moreembodiments of the present disclosure.

FIG. 3 illustrates a cross-sectional view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 4 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 5 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 6 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 7 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 8 illustrates another cross-sectional view of a portion of an iontrap in accordance with one or more embodiments of the presentdisclosure.

FIG. 9 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure.

FIG. 10 illustrates another cross-sectional view of a portion of an iontrap in accordance with one or more embodiments of the presentdisclosure.

DETAILED DESCRIPTION

A microwave (MW) source associated with an ion trap may contribute to anincreased efficiency, relative to other approaches, in trapping and/orcausing transition between quantum states of at least one ion in apotential well. However, providing MW fields with sufficient strengthnear such ions may be a challenge, for instance, when space-limitingon-chip filter capacitors, among other on-chip components, are present.

The present disclosure describes, in various embodiments, that a numberof MW rails can be near an upper surface of an ion trap, which also caninclude a number of radio frequency (RF) rails, the upper surface of theion trap having a planarized topology. Accordingly, one example of anion trap apparatus includes a number of MW rails and a number of RFrails formed with substantially parallel longitudinal axes and withsubstantially coplanar upper surfaces. The apparatus includes twosequences of direct current (DC) electrodes with each sequence formed toextend substantially parallel to the substantially parallel longitudinalaxes of the MW rails and the RF rails. The apparatus further includes anumber of through-silicon vias (TSVs) formed through a substrate of theion trap and a trench capacitor formed in the substrate around at leastone TSV.

In the following detailed description, reference is made to theaccompanying figures that form a part hereof. The figures show by way ofillustration how one or more embodiments of the disclosure may bepracticed.

The figures herein follow a numbering convention in which the firstdigit or digits correspond to the drawing figure number and theremaining digits identify an element or component in the drawing.Similar elements or components between different figures may beidentified by the use of similar digits. For example, 109 may referenceelement “09” in FIG. 1, and a similar element may be referenced as 209in FIG. 2.

FIG. 1A illustrates a perspective view and a top view of portions of anion trap in accordance with one or more embodiments of the presentdisclosure. The perspective view of the ion trap 100 embodimentillustrated in FIG. 1A shows a three-dimensional direction indicator 101where the x axis corresponds to a horizontal direction of the ion trap,the y axis corresponds to a longitudinal direction of the ion trap, andthe z axis corresponds to a vertical direction relative to an uppersurface of the ion trap, the upper surface positioned on a face of theion trap opposite from an interposer die, as described further herein.

As illustrated in FIG. 1A, the ion trap 100 can be fabricated on asubstrate 105. For example, the substrate 105 can be formed on and/orfrom a silicon wafer, which can, in various embodiments, have athickness in a range of from around 50 micrometers (microns) to around500 microns.

In various embodiments, a number of RF rails (e.g., RF1 108-1 and RF2108-2) and a number of MW rails (e.g., MW1 110-1, MW2 110-2, and MW3110-3) can be fabricated above an upper surface of the substrate 105. Asdescribed further herein, other materials (e.g., dielectrics,insulators, shields, etc.) can be formed between the substrate 105 andcomponents (e.g., RF rails, MW rails, etc.) fabricated above the uppersurface thereof. As shown in FIG. 1A, each of the RF rails and the MWrails can be formed with substantially parallel longitudinal axes (inthe y direction) and with substantially coplanar upper surfaces(relative to a line in the x direction). In some embodiments, each ofthe DC electrodes can be formed with substantially coplanar uppersurfaces that are substantially coplanar with the upper surfaces of theMW rails and the RF rails.

Two RF rails and three MW rails are illustrated in FIG. 1A and otherfigures of the present disclosure, although embodiments are not limitedto these numbers and configurations of RF rails and MW rails. That is,the RF rails and MW rails can be fabricated in various configurationssuch that the number, the heights (in the z direction), and/or thewidths (in the x direction) of such rails can be varied as suitable forparticular applications. Moreover, the order in which the RF railsand/or MW rails are fabricated also can be varied. That is, a positionin a sequence of such rails can be varied such that a pair of MW railsmay be adjacent each other and/or a pair of MW rails may be separated byat least one RF rail and similarly with regard to the RF rails relativeto the MW rails. In various embodiments, three or more MW rails may beasymmetrically positioned, as illustrated in FIG. 1A and other figuresof the present disclosure, such that there are, for example, twoadjacent MW rails and one MW rail separated from the two adjacent MWrails by an RF rail.

The RF rails and/or MW rails described as being adjacent each can beseparated (e.g., insulated) by a longitudinal gap (e.g., longitudinalgaps 112-2, 112-3, 112-4, 112-5), as described further herein,fabricated to form substantially parallel longitudinal axes (in the ydirection) of the RF rails 108-1,108-2 and the MW rails 110-1, 110-2,110-3. In some examples, the gaps can be at least partially filled withan insulating material (e.g., a dielectric material). In someembodiments, the dielectric material can be silicon dioxide (e.g.,formed by thermal oxidation), for instance, although embodiments of thepresent disclosure are not so limited.

The RF rails and/or MW rails can, in various embodiments, be fabricatedfrom a conductive material (e.g., copper, silver, gold, etc.) or alloysof two or more conductive materials selected as suitable for conductionand/or transmission of an appropriate signal. For example, a MW rail canbe fabricated from copper with a cross-sectional height and/or width ina range of from around 10 microns to around 100 microns (e.g., in acircular, oval, square, rectangular, etc., cross-sectionalconfiguration) determined appropriate to conduct a current (e.g., fromaround 0.1 amps (A) to around 1.0 A) oscillating at a MW frequency(e.g., from around 0.3 gigahertz (GHz) to around 300 GHz). In variousembodiments, a RF rail can be fabricated, for example, from copper witha cross-sectional height and/or width in a range of from around 10microns to around 100 microns determined appropriate to conduct acurrent (e.g., from around 0.01 A to around 1.0 A) oscillating at an RFfrequency (e.g., from around 3 hertz (Hz) to around 0.3 GHz).

As shown in FIG. 1A, the RF rails 108-1,108-2 and the MW rails 110-1,110-2, 110-3 can, in various embodiments, be fabricated between a firstsequence of DC electrodes 106-1 and a second sequence of DC electrodes106-2. Each of the sequences of DC electrodes can be fabricated toextend substantially parallel (in the y direction) to the substantiallyparallel longitudinal axes of the MW rails and the RF rails. Inaddition, each of the DC electrodes can be formed with an upper surfacethat is substantially coplanar with upper surfaces of the other DCelectrodes and that is substantially coplanar with the upper surfaces ofthe MW rails and/or the RF rails. That is, in various embodiments, theDC electrodes, the MW rails, and/or the RF rails can be formed withsubstantially the same height.

Each of the DC electrodes in the first sequence of DC electrodes 106-1and the second sequence of DC electrodes 106-2 can be separated (e.g.,insulated) from adjacent RF rails 108-1,108-2 and/or adjacent MW rails110-1, 110-2, 110-3 by a longitudinal gap (e.g., longitudinal gaps 112-1and 112-6 in the y direction), as described further herein. Similarly,each of the DC electrodes in the first sequence of DC electrodes 106-1and the second sequence of DC electrodes 106-2 can be separated (e.g.,insulated) from each other by each being fabricated with a horizontalgap between adjacent DC electrodes (e.g., horizontal gaps 109 in the xdirection). In some examples, the longitudinal gaps for the DCelectrodes can be at least partially filled with an insulating material(e.g., a dielectric material). In some embodiments, a width (in the xdirection) between the longitudinal gaps 112-1 and 112-6 can be fromaround 100 microns to around 500 microns.

The two sequences of DC electrodes 106-1, 106-2 can be fabricated as aplurality of matched DC electrodes. For example, as shown in ion trap100, electrode DC1 of the first sequence of DC electrodes 106-1 can bematched with electrode DC2 of the second sequence of DC electrodes106-2, electrode DC3 and be matched with electrode DC4, electrode DC5and be matched with electrode DC6, and so on for the two sequences of DCelectrodes 106-1, 106-2. Accordingly, the two sequences of DC electrodes106-1, 106-2 in combination can be configured to be biased with DCvoltages that contribute to a variable combined electrical field (notshown) and/or magnetic field (B₀) 114 to trap at least one ion 104 in apotential well above at least one of either an upper surface of thesequences of DC electrodes 106-1, 106-2, the RF rails 108-1,108-2, theMW rails 110-1, 110-2, 110-3, and/or a number of ground (GND) rails(e.g., RND rail 107 shown in FIG. 1B).

The at least one ion 104 can be trapped in variable locations in the iontrap 100 by the electrical and/or magnetic fields being controlled byone or more connected devices (e.g., a controller and/or computingdevice) with one or more bonds to an interposer (e.g., as discussed inconnection with FIG. 3). For example, depending on the positive ornegative charge on the at least one ion 104, DC voltages can be raisedor lowered for DC electrodes on either side of a particular DC electrodeto promote transit of the least one ion 104 to the particular electrodeDC electrode and/or to form an electrical potential well that resistsfurther transit of the least one ion.

Depending upon such factors as the charge on the at least one ion 104and/or the shape and/or magnitude of the combined electrical and/ormagnetic fields, the at least one ion can be stabilized at a particulardistance (d) 117 (e.g., from around 20 microns to around 50 microns)above an upper surface of the ion trap 100 (e.g., the coplanar uppersurfaces of the sequences of DC electrodes 106-1, 106-2, RF rails108-1,108-2, MW rails 110-1, 110-2, 110-3, and/or GND rails 107). Tofurther contribute to controlling transit between the variable locationsand/or stabilizing the at least one ion 104 trapped in a particularlocation, the ion trap 100 can, in some embodiments, be operated withina cryogenic vacuum chamber (not shown) capable of cooling the ion trap100 to, for example, a temperature of around 4 degrees Kelvin or lower.

A top view of an ion trap 102 embodiment illustrated in FIG. 1A shows athree-dimensional direction indicator 103 where the x axis correspondsto the horizontal direction of the ion trap 100 in the perspective view,the y axis corresponds to the longitudinal direction of the ion trap 100in the perspective view, and the z axis corresponds to the verticaldirection relative to the upper surface of the ion trap 100 in theperspective view. The top view of the ion trap 102 illustrates the sameconfiguration of the number and/or positioning of the RF rails108-1,108-2, the MW rails 110-1, 110-2, 110-3, and the sequences of DCelectrodes 106-1, 106-2, along with the longitudinal 112 and thehorizontal 109 gaps between them, as illustrated in the perspective viewof the ion trap 100, although embodiments are not so limited.

The top view of the ion trap 102 illustrates that a number of TSVs115-1, 115-2 can, in various embodiments, be fabricated (e.g., using atechnique such as deep reactive-ion etching (DRIE), among others)through the substrate 105 of the ion trap 102. As described furtherherein, the number of the TSVs shown in FIG. 1A can be fabricated withupper surfaces at or below the substantially coplanar upper surfaces ofthe MW rails, the RF rails, and/or the DC electrodes. The number of TSVs115-1, 115-2 shown in FIG. 1A can each be fabricated through thesubstrate in a position suitable for, and can be configured in a mannerso as to, provide an electrical potential to each DC electrode in thetwo sequences of DC electrodes 106-1, 106-2.

The top view of the ion trap 102 also illustrates that a trenchcapacitor 116-1, 116-2 can be fabricated in the substrate 105 around thenumber of TSVs illustrated in FIG. 1A. As described further herein, anumber of the trench capacitors 116-1, 116-2 shown in FIG. 1A can befabricated with upper surfaces at or below the substantially coplanarupper surfaces of the MW rails, the RF rails, and/or the DC electrodes.

FIG. 1B illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. A topview of an ion trap 111 embodiment illustrated in FIG. 1B shows that anumber of GND rails (e.g., GND rail 107) can be fabricated between thetwo sequences of DC electrodes 106-1, 106-2 substantially parallel (inthe y direction) to the substantially parallel longitudinal axes of thetwo sequences of DC electrodes 106-1, 106-2, the RF rails 108-1,108-2,and/or the MW rails 110-1, 110-2, 110-3. For example, FIG. 1B shows asingle GND rail 107 fabricated between the MW2 rail 110-2 and the MW3rail 110-3, where the MW2 rail 110-2 is adjacent the RF1 rail 108-1 andthe MW3 rail 110-3 is adjacent the RF2 rail 108-2, although embodimentsare not limited to this configuration.

The GND rails can, in various embodiments, be fabricated from aconductive material (e.g., copper, silver, gold, etc.) or alloys of twoor more conductive materials selected as suitable for operation as aground line. For example, a GND rail can be fabricated from copper witha cross-sectional height and/or width in a range of from around 10microns to around 100 microns (e.g., in a circular, oval, square,rectangular, etc., cross-sectional configuration). The GND rails caneach be formed with an upper surface substantially coplanar with uppersurfaces of the MW rails, the RF rails, and/or the DC electrodes. Assuch, the GND rails can have widths that are the same as or differentfrom widths of the MW rails and/or the RF rails, depending upon theparticular application, although the DC electrodes, the MW rails, the RFrails, and/or the GND rails can be formed with substantially the sameheight, in various embodiments.

A GND rail that is adjacent an RF rail and/or a MW rail can be separated(e.g., insulated) therefrom by a number of longitudinal gaps. Forexample, GND rail 107 in FIG. 1B is separated from RF1 rail 108-1 bylongitudinal gap 112-3 and GND rail 107 is separated from MW2 rail 110-2by longitudinal gap 112-9, the longitudinal gaps fabricated to form thesubstantially parallel longitudinal axes (in the y direction) of the RFrail 108-1, the MW rail 110-2, and/or the GND rail 107. In someexamples, the gaps can be at least partially filled with an insulatingmaterial (e.g., a dielectric material).

The GND rails can be configured to provide a relatively stable locationin a potential well for the at least one ion 104 above an upper surfaceof the DC electrodes, the MW rails, the RF rails, and/or the GND rails.For example, the GND rails can be fabricated to occupy a longitudinalregion substantially equidistant from the two sequences of DC electrodesand to form a separation between a first number of the MW rails and/orRF rails and a second number of the MW rails and/or RF rails. Such a GNDrail can serve to dampen unintended variations (noise) in the electricaland/or magnetic fields. The GND rails (e.g., GND rail 107) cancontribute to control and/or stabilization the location of the at leastone ion 104 by providing a zeroed reference point that sets a particulardistance (height) (e.g., from around 20 microns to around 50 microns) atwhich the at least one ion 104 is trapped above the upper surface (e.g.,the upper surface of GND rail 107).

FIG. 2 illustrates a perspective view of a TSV and a trench capacitor ofan ion trap in accordance with one or more embodiments of the presentdisclosure. FIG. 2 illustrates an embodiment of a device 220 forproviding a stabilized electrical potential to a DC electrode of an iontrap, as described herein.

The device 220 includes a TSV 215 formed in a substrate 205 and a trenchcapacitor 216 formed around the TSV 215 in the substrate 205. Thesubstrate 205 can be a conductive material, for instance. In someembodiments, the substrate 205 can be silicon (e.g., a silicon wafer).

The TSV 215 can include a core 221 and a ring 222. The core 221 can be aconductive material, for instance. In some embodiments, the core 221 canbe silicon, though embodiments of the present disclosure are not solimited. The ring 222 can be a conductive material, such as polysilicon,for instance, though embodiments of the present disclosure are not solimited. Between the core 221 and the ring 222, and between the ring 222and the substrate 205, can be a dielectric material 224. In someembodiments, the dielectric material can be silicon dioxide (e.g.,formed by thermal oxidation), for instance, though embodiments of thepresent disclosure are not so limited.

The TSV 215 can extend through the substrate 205. That is, the TSV canhave a height (or depth) equal to a thickness of the substrate 205(e.g., from around 50 microns to around 500 microns). In someembodiments, the TSV 215 can have a height of from around 50 microns toaround 500 microns. In some embodiments, the TSV 215 can have a heightof approximately 300 microns.

The trench capacitor 216 can extend partially through the substrate 205.That is, the trench capacitor can have a height (or depth) of less thanthe thickness of the substrate 205. In some embodiments, the trenchcapacitor 216 can have a depth of from around 50 microns to around 250microns. In some embodiments, the trench capacitor 216 can have a heightof approximately 65 microns. Embodiments of the present disclosure donot limit trench capacitors to a particular height.

The trench capacitor 216 can include a plurality of annular rings 225(herein referred to as “rings 225”). Each of the rings 225 can be adifferent distance from the TSV 215 (e.g., from a center of the TSV215). In some embodiments, a distance between each of the rings 225(e.g., incremental distances from a center of the rings) can beconstant. In some embodiments, a distance between one of the rings 225and an adjacent one of the rings 225 can be from around 2 to around 25microns. In some embodiments, a distance between one of the rings 225and an adjacent one of the rings 225 can be approximately 6 microns. Insome embodiments, a distance between an outermost one of the rings 225and the TSV 215 (e.g., a center of the core 221 of the TSV 215) can befrom around 50 to around 70 microns.

Though the embodiment has six rings 225 as illustrated in FIG. 2,embodiments of the present disclosure are not so limited. Additionally,though the rings 225 are shown in FIG. 2 as each completely encirclingthe TSV 215, some embodiments include one or more of the rings 225partially (e.g., not fully) encircling the TSV 215. The rings 225 can befabricated by removing portions of the substrate 205 (e.g., by anetching technique, such as DRIE). Vacancies (e.g., trenches, openings,etc.) in the substrate defined by the rings can be filled with aconductive material. The conductive material can be polysilicon (e.g.,1E19/cm^3 boron-doped polysilicon, for instance), though embodiments ofthe present disclosure are not so limited.

Trench capacitors 216 can be configured with a capacitance high enoughto reduce unintended variation of an electrical field to which anassociated DC electrode contributes, for example, by reducing unintendedvariation (noise) in an electrical potential from a source of anelectrical potential connected to the number of TSVs (e.g., theinterposer die described in connection with FIG. 3). In someembodiments, the trench capacitor 216 can have a capacitance ofapproximately 100 picofarads (e.g., from around 50 to around 150picofarads). In some embodiments, the trench capacitor 215 can have acapacitance of approximately 200 picofarads (e.g., from around 150 toaround 250 picofarads). In some embodiments, the trench capacitor 215can have a capacitance of approximately 400 picofarads (e.g., fromaround 250 to around 600 picofarads).

FIG. 3 illustrates a cross-sectional view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Insome embodiments, FIG. 3 can illustrate a portion of a system 330 fortrapping ions in accordance with one or more embodiments of the presentdisclosure. As shown, the system 330 includes a substrate 305 comprisinga TSV 315 and a trench capacitor 316. The TSV 315 and the trenchcapacitor 316 are illustrated schematically and not in the detail shownin FIG. 2.

The substrate 305 can be bonded to an interposer 332 with a plurality ofbond pads 334. The bond pads 334 can be a conductive material (e.g.,gold, among other conductive materials described herein). Embodiments ofthe present disclosure can allow optical access to the system 330 byusing the bond pads 334 to bond the substrate 305 to the interposer 332instead of using wire bonds that connect directly to the substrate 305as in previous approaches.

Formed on the substrate 305 (e.g., above in the z direction shown inFIG. 1A) can be a sequential plurality of (e.g., three) planarconductive materials, for example, a first planar conductive material(M1) 336, a second planar conductive material (M2) 337, and a thirdplanar conductive material (M3) 338. Each of the planar conductivematerials 336, 337, 338 can be separated by a dielectric material 339(e.g., silicon dioxide, although embodiments are not so limited), whichalso can separate elements of the TSV 315 and/or the trench capacitor316. In some embodiments, the planar conductive materials 336, 337, 338can be gold. Each of the planar conductive materials 336, 337, 338 canbe fabricated to a thickness of from around 1 micron to around 10microns. The first planar conductive material 336 can form a groundplane, the second planar conductive material 337 can form a signalrouting plane, and the third planar conductive material 338 can form aground connection (G) 319 plane and/or a DC rotate rail plane, asdescribed further herein.

The G 319 plane can correspond to the G plane areas 119-1, 119-2 shownon both sides (in the x direction) of the top view of the ion trap 102in FIG. 1A. DC rotate rails 118-1, 118-2 are shown between the G planeareas 119-1, 119-2 and the two sequences of DC electrodes 106-1, 106-2in FIG. 1A, although, as described further herein, the DC rotate railscan be positioned above the two sequences of DC electrodes. DC rotaterail 118-1 can be separated (e.g., insulated) from G plane area 119-1 bylongitudinal gap 112-7 (in the y direction) and DC rotate rail 118-2 canbe separated from G plane area 119-2 by longitudinal gap 112-8. In someexamples, the gaps for the DC rotate rails can be at least partiallyfilled with an insulating material (e.g., a dielectric material).

The signal routing plane 337 can be used for connecting each DCelectrode 306 to a respective TSV 315 and trench capacitor 316 toprovide and/or control the electrical potential thereof (e.g., assupplied by the interposer 332). In various embodiments, the signalrouting plane 337 can be used for connecting and/or controllingpotentials and electrical and/or magnetic fields of a number of RF rails308, a number of MW rails 310, and/or a number of GND rails 307. The DCelectrodes 306, RF rails 308, MW rails 310, and/or GND rails 307 caneach be separated by a longitudinal gap 312 (in the y direction in FIG.1A) that can extend from a top of the second planar conductive material337 (or a top of a dielectric material formed thereon) to or into theground plane of the first planar conductive material 336 (or through adielectric material formed thereon).

The interposer 332 can, in various embodiments, control the operation ofthe system 330 by supplying and/or controlling static DC current to biasthe DC electrodes and an alternating current (AC) for the RF railsand/or the MW rails to create oscillating electrical and/or magneticfields to trap at least one ion above the surface of the system 330(e.g., above the surface of the signal routing plane formed by thesecond planar conductive material 337). The interposer 332 can supplyand/or control the appropriate potential and/or current through a planarconductive material within and/or operatively connected to the TSV 315and/or the trench capacitor 316.

For example, the second planar conductive material 337 can befabricated, in various embodiments, in the TSV 315 (e.g., in the core221 and/or the ring 222 shown in FIG. 2) and can be connected to thesecond planar conductive material 337 from which the number of DCelectrodes 306, the number of RF rails 308, the number of GND rails 307,and/or the number of MW rails 310 are formed to supply and/or controlsignals sent to these components. The trench capacitor 316 associatedwith the TSV 315 can store enough charge (capacitance) to produce anelectrical field to be operatively connected to the second planarconductive material 337 so as to reduce unintended variation of anelectrical field to which an associated DC electrode, among othercomponents, contributes. As shown in FIG. 3, a trench capacitor 316 canhave an upper surface formed from the first planar conductive material336 that is below the second planar conductive material 337, althoughembodiments are not so limited.

As such, a number of TSVs 315 fabricated to supply and/or controlsignals sent to the DC electrodes, among other components, can be formedwith upper surfaces at or below the substantially coplanar uppersurfaces of the DC electrodes, the MW rails, the RF rails, and/or theGND rails formed from the second planar conductive material 337. Anumber of trench capacitors 316 fabricated around at least one TSV 315can be formed in and/or above the substrate 305 with an upper surface ator below the substantially coplanar upper surfaces of the DC electrodes,the MW rails, the RF rails, and/or the GND rails.

Accordingly, an ion trap apparatus 100, 102, as described herein, caninclude a number of MW rails 110-1, 110-2, 110-3 and a number of RFrails 108-1,108-2, which can be formed (e.g., each formed) withsubstantially parallel longitudinal axes and with substantially coplanarupper surfaces. The apparatus can include two sequences of DC electrodes106-1, 106-2 with each sequence formed to extend substantially parallelto the substantially parallel longitudinal axes of the MW rails and theRF rails. The apparatus can further include a number of TSVs 115, 215,315 formed through the substrate 205, 305 of the ion trap and a trenchcapacitor 116, 216, 316 formed in the substrate around at least one TSV.

In various embodiments, the two sequences of DC electrodes 106-1, 106-2can be configured to be biased with DC voltages (e.g., as a plurality ofmatched DC electrodes) that contribute, by conduction of staticcurrents, to a combined electrical field and/or magnetic field to trapat least one ion 104 in a potential well (e.g., in variable locations)above at least one of either an upper surface of the DC electrodes, theMW rails, and/or the RF rails. The number of RF rails 108-1,108-2 can,in various embodiments, be configured to conduct an oscillating current,at a frequency less than that conducted by the MW rails, to contributeto a variable combined electrical field and/or magnetic field to trapthe at least one ion in the potential well above the at least one ofeither the DC electrodes, the MW rails and the RF rails. The number ofMW rails 110-1, 110-2, 110-3 can, in various embodiments, be configuredto conduct an oscillating current, at a frequency higher than thatconducted by the RF rails, to contribute to (e.g., cause) transitionbetween quantum states of the at least one ion in the potential wellabove the at least one of either the MW rails or the RF rails.

The number of TSVs 115, 215, 315 formed through the substrate can, invarious embodiments, be configured to provide an electrical potential tothe DC electrodes (e.g., each of the DC electrodes) in the two sequencesof DC electrodes 106-1, 106-2. The trench capacitor 116, 216, 316 formedin the substrate can, in various embodiments, be configured with acapacitance to reduce unintended variation of an electrical field towhich an associated DC electrode contributes.

In various embodiments, the apparatus 111 can further include a numberof GND rails 107 formed between the two sequences of DC electrodes106-1, 106-2, the GND rails formed as substantially parallel to thesubstantially parallel longitudinal axes of the two sequences of DCelectrodes, the MW rails, and/or the RF rails. The number of GND rails107 can be formed (e.g., each formed) with an upper surfacesubstantially coplanar with upper surfaces of the MW rails, the RFrails, and/or the DC electrodes. The number of GND rails 107 can beconfigured to (e.g., at least one GND rail configured to) provide arelatively stable location in the potential well for the at least oneion above the upper surface of the DC electrodes, the MW rails, the RFrails, and/or the GND rails.

FIG. 4 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Iontraps consistent with the embodiment of the ion trap 440 illustrated inFIG. 4 and embodiments of ion traps illustrated subsequently can differfrom embodiments previously presented concerning, for instance, relativepositioning of MW rails with regard to positioning of other components,for instance, DC electrodes, RF rails, GND, rails, etc. For example, MWrails 110-1, 110-2, 110-3, 310 are shown and described in connectionwith FIGS. 1A-1B and 3 as being fabricated from the second planarconductive material 337, which is fabricated above the first planarconductive material 336 and the upper surface of the substrate 305,along with other components such as DC electrodes, RF rails, GND, rails,etc. By comparison, MW rails MW1 441-1, MW2 441-2, MW3 441-3 illustratedin FIG. 4, and corresponding MW rails illustrated subsequently, aredescribed as being fabricated in the substrate 305 so as to be below(e.g., in the z direction as shown in FIG. 1A) the first planarconductive material 336.

As illustrated in connection with FIGS. 8-10, the ion trap 440 shown inFIG. 4 can be fabricated on and in the substrate, for example, as shownat 805 in FIG. 8. For example, the substrate 805 can be formed on and/orfrom a silicon wafer, which can, in various embodiments, have athickness in a range of from around 50 microns to around 500 microns.

In various embodiments, a number of RF rails (e.g., RF1 408-1, RF2408-2) and/or GND rails (e.g., GND 407) can be fabricated above an uppersurface of the substrate. A number of MW rails (e.g., MW1 441-1, MW2441-2, MW3 441-3) can be fabricated below the upper surface of thesubstrate (e.g., below the first planar conductive material 336,dielectrics, insulators, shields, etc., formed on and/or above the uppersurface of the substrate). The MW rails are shown as stippled toindicate being below the first planar conductive material 336.

As shown in FIG. 4, each of the RF rails, GND rails, and/or MW rails canbe formed with substantially parallel longitudinal axes (in the ydirection as shown in FIG. 1A) and/or with substantially coplanar uppersurfaces (relative to a line in the x direction). In some embodiments,each of the DC electrodes in the two sequences of DC electrodes 406-1and 406-2 above the upper surface of the substrate can be formed withsubstantially coplanar upper surfaces that are substantially coplanarwith the upper surfaces of the RF rails and/or GND rails.

One GND rail, two RF rails, and three MW rails are illustrated in FIG. 4and other figures of the present disclosure, although embodiments arenot limited to these numbers and configurations of GND rails, RF rails,and MW rails. That is, the GND rails, RF rails, and/or MW rails can befabricated in various configurations such that the number, the heights(in the z direction), and/or the widths (in the x direction) of suchrails can be varied as suitable for particular applications.

The order (in the x direction) in which the GND rails, RF rails, and/orMW rails are fabricated also can be varied. That is, a position in asequence of such rails, as viewed from the top, can be varied such thata pair of MW rails may be adjacent each other and/or a pair of MW railsmay be separated by at least one GND rail and/or RF rail and similarlywith regard to the GND rails and RF rails relative to the MW rails.

In addition, as viewed from the top, positions of MW rails cn appear tooverlap with the sequences of DC electrodes, the RF rails, and/or theGND rails. That is, as shown in FIG. 4 and other figures of the presentdisclosure, a position of at least one of the MW rails may overlap (inthe x direction) with and/or be covered by the positions of the DCelectrodes, DC rotate rails, GND rails and/or RF rails because the MWrails are fabricated below the surface of the substrate whereas the DCelectrodes, DC rotate rails, GND rails and/or RF rails are fabricatedabove the surface of the substrate. For example, the position of the MW1rail 441-1 is shown to overlap (in the x direction) the position of theRF1 rail 408-1 and both the MW2 rail 441-2 and the MW3 rail 441-3 arecovered by (e.g., completely underneath) the sequence of DC electrodes406-2. The positions of the MW rails being overlapped and/or covered bythe positions of the DC electrodes, DC rotate rails, GND rails and/or RFrails can, for instance, contribute to narrowing the ion trap regionbetween the DC electrodes.

In various embodiments, three or more MW rails may be asymmetricallypositioned (in the x direction), as illustrated in FIG. 4 and otherfigures of the present disclosure, such that there are, for example, twoadjacent MW rails (e.g., 441-2, 441-3) and one MW rail (e.g., 441-1)separated from the two adjacent MW rails by a number of GND rails (e.g.,407) and/or RF rails (e.g., 408-1, 408-2). Moreover, the three or moreMW rails may be asymmetrically positioned (in the x direction) relativeto a centerline (not shown) in the separation distance between the twosequences of DC electrodes. For example, the three MW rails 441-1,441-2, 441-3 shown in FIG. 4 may each have a width (in the x direction)of 60 microns and a centerline (not shown) of MW1 rail 441-1 may beoffset in a direction of the G plane 419-1 from the centerline of the DCelectrodes by a distance of 100 microns. A centerline (not shown) of MW2rail 441-2 may be offset in the direction of the G plane 419-2 from thecenterline of the DC electrodes by a distance of 150 microns and acenterline (not shown) of MW3 rail 441-3 may be offset in the directionof the G plane 419-2 by a distance of 250 microns.

Asymmetric positioning of the three MW rails relative to the centerlinein the separation distance between the two sequences of DC electrodesmay contribute to providing a low net MW field strength (e.g.,approximately zero) at a position between the two sequences of DCelectrodes at which the at least one ion may be trapped while enabling astrong MW gradient to be created in the ion trap region between the DCelectrodes. Alternatively and/or in addition, the asymmetric positioningof the three MW rails may contribute to enabling various different MWfield strengths (e.g., a combination of electrical field strengthsand/or magnetic field strengths) between the two sequences of DCelectrodes to affect spin transitions (e.g., transition between quantumstates) of at least one ion in a potential well.

Adjacent GND lines, RF rails, and/or sequences of DC electrodes formedabove the substrate each can be separated (e.g., insulated) by alongitudinal gap (e.g., longitudinal gaps 412-10, 412-11, 412-12,412-13), as described further herein, fabricated to form substantiallyparallel longitudinal axes (in the y direction) of the GND rail 407, RFrails 108-1,108-2, and/or the two sequences of DC electrodes 406-1,406-2. Similarly, each of the DC electrodes in the two sequences of DCelectrodes 106-1, 106-2 can be separated (e.g., insulated) from eachother by each being fabricated with a horizontal gap between adjacent DCelectrodes (e.g., horizontal gaps 409 in the x direction). In someexamples, the longitudinal gaps and/or horizontal gaps can be at leastpartially filled with an insulating material (e.g., a dielectricmaterial). In some embodiments, the dielectric material can be silicondioxide (e.g., formed by thermal oxidation), for instance, althoughembodiments of the present disclosure are not so limited.

FIG. 5 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Theembodiment of the ion trap 545 illustrated in FIG. 5 shows componentsand positioning of components consistent with those illustrated in FIG.4, although embodiments are not so limited.

The two sequences of DC electrodes 506-1, 506-2 shown in FIG. 5 can befabricated as a plurality of matched DC electrodes. For example, asshown in ion trap 100 in FIG. 1A, electrode DC1 of the first sequence ofDC electrodes 106-1 can be matched with electrode DC2 of the secondsequence of DC electrodes 106-2, electrode DC3 can be matched withelectrode DC4, electrode DC5 can be matched with electrode DC6, and soon for the two sequences of DC electrodes 106-1, 106-2.

As illustrated in the ion trap 545 of FIG. 5, a particular TSV 515 thatis associated with a particular trench capacitor 516 to supply and/orcontrol signals sent through the second planar conductive material 337to the DC electrodes can be connected to each DC electrode fabricatedfrom the second planar conductive material 337, as shown for sequence ofDC electrodes 506-1, and as described in connection with FIGS. 2 and 3.As shown in FIG. 5, the TSVs 515 and associated trench capacitors 516can be positioned in the substrate out beyond the MW rails (in the xdirection toward the G plane 419-1 in FIG. 4), although embodiments arenot so limited (e.g., as shown in FIG. 8 for MW rails 841-2, 841-3 inthe substrate 805 relative to the sequence of DC electrodes 806-2 abovethe substrate).

FIG. 6 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Theembodiment of the ion trap 650 illustrated in FIG. 6 can includecomponents and positioning of components consistent with thoseillustrated in FIGS. 4 and 5, although embodiments are not so limited.However, for purposes of clarity, the ion trap 650 illustrated in FIG. 6does not show components positioned in the substrate and/or under thefirst planar conductive material 336 (e.g., MW rails 441-1, 441-2, 441-3shown in FIG. 4 and MW rails 841-1, 841-2, 841-3 shown in FIG. 8). Nordoes FIG. 6 show elements under the third planar conductive material638, from which the DC rotate rails 618-1, 618-2 and the G planes 619-1,619-2 are formed.

In addition, FIG. 6 illustrates a first DC rotate rail 618-1 positionedlongitudinally (in the y direction in FIG. 1A) above horizontallyoriented DC electrodes of a first longitudinal sequence of DC electrodes606-1 and a second DC rotate rail 618-2 positioned longitudinally abovehorizontally oriented DC electrodes of a second longitudinal sequence ofDC electrodes 606-2. Each longitudinal DC rotate rail 618-1, 618-2 canbe fabricated from the third planar conductive material 638 from whichan adjacent G plane 619-1, 619-2 is fabricated, as described inconnection with FIG. 3.

In various embodiments, DC rotate rails can be fabricated to carry astatic DC current intended to reduce unintended variation of anelectrical field to which the number of DC electrodes in an underlyingsequence of DC electrodes contributes by reducing unintended variationsin electrical potentials of the DC electrodes (e.g., based uponmanufacturing differences between DC electrodes in length, width,height, composition, etc.). In various embodiments, DC rotate rails canbe formed in various widths (in the x direction), for example, rangingfrom around 50 microns to around 150 microns.

As shown in FIG. 6, each of the DC rotate rails 619-1, 618-2 and thevertically stacked sequence of DC electrodes 606-1, 606-2 with which theDC rotate rail is associated can be formed with substantially parallellongitudinal axes (in the y direction). In some embodiments, each of theDC rotate rails 619-1, 618-2 can be formed with substantially coplanarupper surfaces (relative to a line in the x direction) that aresubstantially coplanar with the upper surface of a laterally positionedG plane 619-1, 619-2. In some embodiments, the G planes 619-1, 619-2 mayextend (in the x and y directions) to the outside edges of the ion trap650.

In some embodiments, a DC rotate rail (e.g., DC rotate rail 618-1) canbe positioned adjacent a G plane (e.g., G plane 619-1) and separated(e.g., insulated) therefrom by a longitudinal gap (e.g., longitudinalgap 612-7 in the y direction). Such a longitudinal gap can be formedfrom an upper surface of the third planar conductive material 638 (orthrough a top of a dielectric material formed thereon) to or into thesecond planar conductive material 637 (or a dielectric material formedthereon) from which, for example, the DC electrodes are formed. In someexamples, the longitudinal gaps for the DC rotate rails can be at leastpartially filled with an insulating material (e.g., a dielectricmaterial). In some embodiments, the DC rotate rails can be positioned toleave a larger gap than shown in FIG. 6 between the closest G plane(e.g., DC rotate rail 618-1 being shifted toward RF1 608-1), in whichcase use of an insulating material may be reduced.

FIG. 7 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Theembodiment of the ion trap 755 illustrated in FIG. 7 can includecomponents and positioning of components consistent with thoseillustrated in FIGS. 4-6, although embodiments are not so limited. Forpurposes of clarity, the ion trap 755 illustrated in FIG. 7 does notshow components positioned in the substrate and/or under the firstplanar conductive material 336 (e.g., MW rails 441-1, 441-2, 441-3 shownin FIG. 4 and MW rails 841-1, 841-2, 841-3 shown in FIG. 8). However,FIG. 7 does show elements under the third planar conductive material738, from which the DC rotate rails 718-1, 718-2 and/or the G planes719-1, 719-2 are formed.

In addition, the top view of the portion of the ion trap 755 is shiftedupward (in the y direction) relative to the top views of the ion trapsshown in FIGS. 4-6. As such, FIG. 7 shows a first DC electrode 750-1 ata longitudinal end (upper end in the y direction) of the first sequenceof DC electrodes 706-1 and a second DC electrode 750-2 at a longitudinalend of the second sequence of DC electrodes 706-2.

A second number of TSVs (e.g., TSVs 743-1, 743-2) can, in variousembodiments, be fabricated (e.g., using a technique such as DRIE, amongothers) through the substrate of the ion trap 755 and connected to thesecond planar conductive material 737, where a second number of trenchcapacitors 744-1, 744-2 can be fabricated in the substrate materialaround the second number of TSVs (e.g., each of TSVs 743-1, 743-2). Thesecond number of TSVs 743-1, 743-2 can be fabricated longitudinallyproximate to (in the y direction) at least one DC electrode 750-1, 750-2at the longitudinal ends of the sequences of DC electrodes 706-1, 706-2(e.g., longitudinally adjacent but not within the sequences of DCelectrodes).

The second number of TSVs 743-1, 743-2 and trench capacitors 744-1,744-2 can be similarly fabricated in and through the substrate to themanner in which the first number of TSVs 715-1, 715-2 and trenchcapacitors 716-1, 716-2 is fabricated in order to provide and/or controlelectrical potential supplied by the interposer 332. The first number ofTSVs 715-1, 715-2 and trench capacitors 716-1, 716-2, however, provideand/or control electrical potential through the second planar conductivematerial 737 to the DC electrodes formed from the second planarconductive material. In contrast, the second number of TSVs 743-1, 743-2and trench capacitors 744-1, 744-2 provide and/or control electricalpotential through the second planar conductive material 737 to the DCremote rails 718-1, 718-2 formed from the third planar conductivematerial 738, which can be the same conductive material from which the Gplanes 719-1, 719-2 are formed.

The second planar conductive material 737 connected to the second numberof TSVs 743-1, 743-2 can, in various embodiments, enable the secondnumber of TSVs 743-1, 743-2 (and the associated trench capacitors 744-1,744-2) to be individually connected by a number of vias 746-1, 746-2 toa longitudinal DC rotate rail 718-1, 718-2 formed from the thirdconductive material 738 to reduce unintended variation of an electricalfield to which the number of DC electrodes contributes. In variousembodiments, the vias 746-1, 746-2 can be formed through a dielectricmaterial 339 that separates (e.g., insulates) (e.g., silicon dioxide,although embodiments are not so limited) the second planar conductivematerial 737 from the third planar conductive material 738. Although,TSV 743-1 and associated trench capacitor 744-1, for example, are shownas being at a different location from that of the via 746-1 for purposesof clarity, embodiments are not so limited. For example, as shown inFIG. 8, a second TSV 843-1 and associated second trench capacitor 844-1can be directly under the DC rotate rail 818-1 formed from the thirdplanar conductive material 838, with the second planar conductivematerial 837, dielectric material 839, and via (not shown) fabricatedbetween the second TSV 843-1 and the DC rotate rail 818-1.

FIG. 8 illustrates another cross-sectional view of a portion of an iontrap in accordance with one or more embodiments of the presentdisclosure. The embodiment of the ion trap 860 illustrated in FIG. 8 caninclude components and positioning of components consistent with thoseillustrated in FIGS. 4-7, although embodiments are not so limited. Forpurposes of illustration, the cross-sectional view of the ion trap 860shown in FIG. 8 cuts through the positions of the second number of TSVs743-1, 743-2 and the associated trench capacitors 744-1, 744-2 shown inFIG. 7, although, in some embodiments, DC electrodes may not be presentpast the longitudinal ends of the sequences of DC electrodes as shown at806-1 and 806-2 in FIG. 8. The RF, MW, and/or GND rails, however, canextend through the cut line, as shown in FIG. 7.

As shown in FIG. 8, the second TSVs 843-1, 843-2 and the associatedsecond trench capacitors 844-1, 844-1 can, in some embodiments, bedirectly under the two DC rotate rails 818-1, 818-2 formed from thethird planar conductive material 838. The second planar conductivematerial 837, a dielectric material 839, and a via (not shown) can befabricated between each of the second TSVs 843-1, 843-2 and the DCrotate rail rails 818-1, 818-2.

A number of longitudinal gaps (in the y direction as shown in FIG. 1A)can be formed (e.g., etched) through the second planar conductivematerial 837 in a number of locations to form the substantially parallellongitudinal RF rails 808-1, 808-2 and/or GND rail 807. For example,longitudinal gap 812-10 can be formed through the second planarconductive material 837 and the dielectric 839 to or into the firstplanar conductive material 836 to separate (e.g., insulate) the DCelectrodes of the first sequence of DC electrodes 806-1 from the firstRF rail 808-1. As described herein, the first planar conductive material836 can be fabricated over an upper surface (in the z direction in FIG.1A) of the substrate 805. In various embodiments, other materials (e.g.,dielectrics, insulators, shields, etc.) can be formed between thesubstrate 805 and first planar conductive material 836 fabricated abovethe upper surface thereof. In various embodiments, the other materials(e.g., dielectrics, insulators, shields, etc.) can be formed on an uppersurface and/or a lower surface of the first planar conductive material836.

In various embodiments, a plurality of trenches can be fabricated (e.g.,etched) into the substrate 805 to serve as conduits for MW rails. Theembodiment of the ion trap 860 illustrated in FIG. 8 shows by way ofexample three trenches 851-1, 851-2, 851-3 for MW rails fabricated intothe substrate 805 below the first planar conductive material 836 atvarious positions relative to the sequences of DC electrodes 806-1,806-2, the RF rails 808-1, 808-2, and/or the GND rail 807, althoughembodiments are not so limited in numbers of components and/orpositioning thereof. That is, embodiments of the present disclosure arenot limited to the MW rail trenches 851-1, 851-2, 851-3 being formedbelow the first planar conductive material 836 as shown such that trench851-1 is partially under the first sequence of DC electrodes 806-1 andpartially under the first RF rail 808-1, trench 851-2 is partially underthe under the second RF rail 808-2 and partially under the secondsequence of DC electrodes 806-2, and trench 851-3 is completely under Gplane 819-2, nor is the number of trenches for MW rails and/or theplurality of MW rails limited to three.

As shown in the embodiment of the ion trap 860 illustrated in FIG. 8,each of the trenches 851-1, 851-2, 851-3 can be fabricated as a conduitfor MW rails 841-1, 841-2, 841-3, respectively. As described further inconnection with FIG. 9, each MW rail can, in various embodiments, befabricated with an input line and an output line. For example, MW rail841-2 can include an output line 847-2 fabricated at the bottom of thetrench 851-2 with an input line 852-2 fabricated to fill substantially aremainder of the trench 851-2.

The input line and the output line of the MW rail can each be fabricatedfrom a conductive material (e.g., copper, among others described herein)with a cross-sectional height and/or width in a range of from around 10microns to around 100 microns (e.g., in a circular, oval, square,rectangular, etc., cross-sectional configuration). As such, each trenchcan be fabricated with corresponding width in a range of from around 10microns to around 100 microns and a depth in a range of from around 20microns to around 200 microns, the lower and upper values of such rangesbeing adjustable to enable fabrication of other materials between theinput line and the output line and/or between the input line and/or theoutput line and boundaries of the trench.

For example, as shown for MW rail 841-2, a dielectric material 849(e.g., silicon dioxide, among others) can, in various embodiments, befabricated on the upper surface of the output line 847-2, the uncoveredremaining surface of the trench 851-2, and/or the upper surface of theinput line 852-2. Such a dielectric material 849 can, for instance,insulate crosstalk between oscillating MW current carried by the inputline 852-2 and oscillating MW current carried by the output line 852-1.

Alternatively and/or in addition, a MW shield 848 layer (e.g., formedfrom copper, gold, and/or superconducting niobium, among other elementsand/or alloys) can be fabricated in a thickness in a range of fromaround 1 micron to around 5 microns above and/or adjacent (in the xdirection in FIG. 1A) the upper surface of the input line (e.g., inputline 852-2). In various embodiments, the MW shield 848 layer can befabricated above or below the first planar conductive material 836.

The MW shield 848 layer can, for example, contribute to shunting and/orshielding the input line and/or a magnetic field (B₀) (e.g., as shown at114 in FIG. 1A) of the associated input line (e.g., input line 852-2)for contribution to trapping and/or quantum state transition of the atleast one ion 804. For example, the MW shield 848 layer can be used forshunting and/or shielding the input line and/or the magnetic field (B₀)relative to possible effects of and/or on overlying and/or nearbysequences of DC electrodes, RF rails, and/or GND rails (e.g., sequenceof DC electrodes 806-1, RF rail 802-1, and/or GND rail 807 in connectionwith input line 852-1). In some embodiments, an effect of fabrication ofthe MW shield 848 layer on a strength of a magnetic field formed by theinput line 852-2 can be compensated for by reducing thickness of thefirst planar conductive material 836 and/or the second planar conductivematerial 837 in the vicinity of the MW shield 848 layer and/or the inputline 852-2.

Accordingly, an ion trap system can, in various embodiments as describedherein, include a substrate material (e.g., as shown at 105, 305, etc.)and three sequential planar conductive materials formed above thesubstrate material. The three sequential planar conductive materials caninclude a first planar conductive material that forms a ground plane(e.g., as shown at 336, 836, etc.), a second planar conductive materialthat forms a signal routing plane (e.g., as shown at 337, 637, 837,etc.), and a third planar conductive material (e.g., as shown at 338,638, 838, etc.) that can, for example, form a G plane (e.g., as shown at319, 619, 819, etc.). As described herein, the second planar conductivematerial can be separated from the first planar conductive material andthe third planar conductive material by at least one dielectric material(e.g., as shown at 339, 839, etc.). The ion trap system can, in variousembodiments, include a first number of TSVs (e.g., as shown at 115, 215,315, 1015, etc.) formed through the substrate material and a firstnumber of trench capacitors (e.g., as shown at 116, 216, 316, 1016,etc.) formed in the substrate material around at least one of the firstnumber of TSVs.

The ion trap system can, in various embodiments, include a number oflongitudinal gaps (e.g., as shown at 112-1 through 112-9, 412-10 through412-13, etc.) formed in the second planar conductive material, forexample, to separate two longitudinal sequences of DC electrodes (e.g.,as shown at 106-1 and 106-2, 406-1 and 406-2, etc.) from at least twoseparate longitudinal RF rails (e.g., as shown at 108-1 and 108-2, 408-1and 408-2, etc.) positioned between the two longitudinal sequences of DCelectrodes. As described herein, the number of longitudinal gaps can,for example, extend from a top surface of the second planar conductivematerial to at least a top surface of the first planar conductivematerial (e.g., as shown at 312, 812-10, etc.). The ion trap system can,in various embodiments, include a first number of TSVs (e.g., as shownat 115, 215, 315, 1015, etc.) formed through the substrate material anda first number of trench capacitors (e.g., as shown at 116, 216, 316,1016, etc.) formed in the substrate material around at least one of thefirst number of TSVs.

The ion trap system can, in various embodiments, include a number ofhorizontal gaps (e.g., as shown at 109, 409, etc.) formed in the twolongitudinal sequences of DC electrodes to form two longitudinalsequences of separate DC electrodes. In some embodiments, twolongitudinal sequences of matching DC electrodes can be formed, where achargeable face of each DC electrode in a first sequence is opposed by achargeable face of the same width (in the y direction in FIG. 1A) of acorresponding DC electrode in a second sequence.

An electrical potential (e.g., voltage) can be provided to a number ofDC electrodes in the two longitudinal sequences of DC electrodes by theDC electrodes being connected to the first number of TSVs by the secondplanar conductive material (e.g., as shown at 306, 315, 337, etc.). Thetwo longitudinal sequences of DC electrodes can, in some embodiments, beconnected to the first number of TSVs on an opposite side of thesubstrate from a source (e.g., interposer die 332) of an electricalpotential connected to the first number of TSVs.

The ion trap system can, in various embodiments, include a second numberof TSVs (e.g., as shown at 743, 843, 1043, etc.) formed through thesubstrate material (e.g., as shown at 805, 1005, etc.) and connected tothe second planar conductive material (e.g., as shown at 837, 1037,etc.) and a second trench capacitor (e.g., as shown at 744, 844, 1044,etc.) formed in the substrate material around at least one of the secondnumber of TSVs. In some embodiments, the second number of TSVs can beformed longitudinally proximate to at least one DC electrode (e.g., asshown at 750-1 and 750-2, etc.) at longitudinal ends of the sequences ofDC electrodes (e.g., as shown at 706-1 and 706-2). That is, the DCelectrode (e.g., as shown at 750-1 and 750-2, etc.) proximate to alongitudinal end of one of the sequences may be next to but not withinthe sequence of DC electrodes.

The second planar conductive material that is connected to the secondnumber of TSVs can, in various embodiments, be connected by a number ofvias (e.g., as shown at 746-1 and 746-2, etc.) to a longitudinal DCrotate rail (e.g., as shown at 118, 718, 818, etc.) formed from thethird planar conductive material (e.g., as shown at 638, 738, 838, etc.)to reduce unintended variation of an electrical field to which thenumber of DC electrodes contributes. For instance, the unintendedvariation of the electrical field can be reduced by reducing unintendedvariation in an electrical potential of the DC electrode (e.g., basedupon manufacturing differences between DC electrodes in length, width,height, composition, etc.).

In various embodiments, the number of longitudinal gaps can befabricated in the second planar conductive material to separate at leasttwo longitudinal MW rails (e.g., the three MW rails shown at 110, 441,etc.) positioned between the two longitudinal sequences of DC electrodesfrom the two longitudinal sequences of DC electrodes and the at leasttwo RF rails. In some embodiments, the number of longitudinal gaps(e.g., as shown at 112-3 and 112-9, 412-11 and 412-13, etc.) are formedin the second planar conductive material to separate a longitudinal GNDrail (e.g., as shown at 107, 407, 807, etc.) positioned between two RFrails (e.g., as shown at 108-1 and 108-2, 408-1 and 408-2, etc.) fromthe two longitudinal sequences of DC electrodes and/or the two RF rails.In some embodiments, the longitudinal GND rail can be positionedadjacent two adjacent MW rails that are positioned between the two RFrails (e.g., as shown at 107, 108-1, 108-2, 110-2, 110-3, etc.).

The ion trap system can, in various embodiments, include at least twolongitudinal MW rails (e.g., the three MW rails shown at 441, 841, 1041,etc.) positioned (e.g., fabricated) in the substrate below the firstplanar conductive material (e.g., as shown at 836, 1036, etc.). At leastone of the longitudinal MW rails can, in some embodiments, be fabricatedto include an input line (e.g., as shown at 852, 952, 1052, etc.) forinput of an oscillating MW current and an output line (e.g., as shown at847, 947, 1047, etc.) for output of the oscillating MW current. Theinput line can be positioned more proximate to the first planarconductive material (e.g., as shown at 836, 1036, etc.) than the outputline. That is, in some embodiments, the input line and the output linecan be vertically stacked with the input line closer to the first planarconductive material.

As described further in connection with FIG. 9, a number of vias (e.g.,as shown at 979-1, 979-2, 979-3, etc.) can be formed through adielectric material (e.g., as shown at 849, etc.) that separates theinput line and the output line. As such, the input line (e.g., 952-1)and the output line (e.g., 947-1), or extensions thereof, can beconnected to one another by a via (e.g., 979-1) through the dielectricmaterial to enable reversal in a direction (e.g., around a 180 degreeturnaround) of the oscillating MW current.

FIG. 9 illustrates another top view of a portion of an ion trap inaccordance with one or more embodiments of the present disclosure. Theembodiment of the ion trap 965 illustrated in FIG. 9 can includecomponents and positioning of components consistent with thoseillustrated in FIGS. 4-8 in an ion trap region 968, although embodimentsare not so limited. The top views of the ion trap 965 shown in FIG. 9are from a viewpoint that can illustrate more components of the ion trapsystem than illustrated in FIGS. 4-8. For example, more inclusive viewsare shown in FIG. 9 of portions of an ion trap die 966 that includes theion trap region 968.

As further described in connection with FIG. 10, the view of ion trapdie 966-1 schematically illustrates input connections 970-1, 970-2,970-3 for input of oscillating MW current, for example, above an uppersurface of the ion trap die 966-1 and at an edge of the ion trap die966-1. In some embodiments, at least one of the input connections 970-1,970-2, 970-3 can be split in two, for instance, to reduce far fieldmagnetic effects. The oscillating MW current can be supplied directly orindirectly by, for example, a negative pole of a source (not shown). Forexample, the oscillating MW current can be supplied directly from amagnetron or the oscillating MW current can be supplied indirectlythrough an interposer (e.g., as shown at 332).

As further described in connection with FIG. 10, the oscillating MWcurrent can, in various embodiments, be input by the three inputconnections 970-1, 970-2, 970-3 into three connected input conductinglines 969-1, 969-2, 969-3. In some embodiments, the three connectedinput conducting lines 969-1, 969-2, 969-3 can each be split near theedge of the ion trap die 966-1 to connect to each of the split inputconnections 970-1, 970-2, 970-3. The three connected input conductinglines 969-1, 969-2, 969-3 can be fabricated so as to narrow (e.g., indiameter, circumference, height, width, gauge, etc.) and/or becomereduced in height relative to the surface of the ion trap die 966-1 soas to each fit within a trench in the ion trap region 968 (e.g.,trenches shown at 1051-1, 1051-2, 1051-3 in FIG. 10), the trenches beingfabricated (e.g., etched) in the ion trap die 966-1 (e.g., the substratethereof).

As such, the input conducting lines 969-1, 969-2, 969-3 can befabricated to become the input lines 952-1, 952-2, 952-3 that contributeto the MW rails that transit through the ion trap region 968 under thefirst planar conductive material (e.g., as shown at 1036, etc.). Asshown at 971-1, 971-2, 971-3, the input lines 952-1, 952-2, 952-3 eachcan be fabricated to extend beyond the ion trap region 968 (e.g., intrenches under the first planar conductive material).

As further described in connection with FIG. 10, the view of ion trapdie 966-2 schematically illustrates output connections 973-1, 973-2,973-3 for output of previously input oscillating MW current. The outputconnections 973-1, 973-2, 973-3 can, for example, be positioned abovethe upper surface of the ion trap die 966-2 and at the edge of the iontrap die 966-2, similar to the input connections 970-1, 970-2, 970-3. Invarious embodiments, the oscillating MW current can be received directlyor indirectly by a positive pole of the source (not shown). For example,the oscillating MW current can be received directly by the magnetron orthe oscillating MW current can be received indirectly through theinterposer (e.g., as shown at 332). In some embodiments, the previouslyinput oscillating MW current can be output to a grounded line and/orreceiver (not shown).

In various embodiments, the previously input oscillating MW current thathas transited through the ion trap region 968 in the input lines 952-1,952-2, 952-3 and subsequently in the extended input lines 971-1, 971-2,971-3 that extend beyond the ion trap region 968 can be reversed indirection (e.g., around a 180 degree reversal in the direction of theoscillating MW current). As further described in connection with FIG.10, the direction of the input oscillating MW current can be reversedinto the extended output lines 974-1, 974-2, 974-3 that extend beyondthe ion trap region 968. The extended output lines 974-1, 974-2, 974-3can be fabricated to become the output lines 947-1, 947-2, 947-3 underthe input lines 952-1, 952-2, 952-3 that contribute to the MW rails thattransit through the ion trap region 968 (e.g., in trenches 1051-1,1051-2, 1051-3) under the first planar conductive material (e.g., asshown at 1036, etc.).

The three output lines 947-1, 947-2, 947-3 can be connected to threeoutput conducting lines 972-1, 972-2, 972-3. The output conducting lines972-1, 972-2, 972-3 can be fabricated so as to broaden (e.g., indiameter, circumference, height, width, gauge, etc.) and/or be increasedin height relative to the surface of the ion trap die 966-2 so as toeach exit at least partially from its trench in the ion trap region 968(e.g., trenches 1051-1, 1051-2, 1051-3). The three output lines 947-1,947-2, 947-3 can be connected to the output connections 973-1, 973-2,973-3 above the upper surface of the ion trap die 966-2 for output ofpreviously input oscillating MW current.

The view of ion trap die 966-3 schematically illustrates an overlay ofthe view of ion trap die 966-1 onto the view of ion trap die 966-2. Asshown in the view of ion trap die 966-3, the extended input lines 971-1,971-2, 971-3 shown in 966-1 can be similar in size and/or position tothe extended output lines 974-1, 974-2, 974-3 shown in 966-2 upon whichthe extended input lines 971-1, 971-2, 971-3 are vertically stacked. Theextended input lines 971-1, 971-2, 971-3 vertically stacked upon (e.g.,paired with) the extended output lines 974-1, 974-2, 974-3 are shown at978-1, 978-2, 978-3, respectively, in ion trap die 966-3.

The extended input lines 971-1, 971-2, 971-3 and the extended outputlines 974-1, 974-2, 974-3 can be separated (e.g., insulated) from eachother. For example, the extended input lines 971-1, 971-2, 971-3 and theextended output lines 974-1, 974-2, 974-3 can be separated by adielectric material (e.g., as shown at 849, 1049, etc.). In someembodiments, the dielectric material can be silicon dioxide (e.g.,formed by thermal oxidation), for instance, although embodiments of thepresent disclosure are not so limited.

A number of vias 979-1, 979-2, 979-3 can be formed through thedielectric material that separates, for example, the extended inputlines 971-1, 971-2, 971-3 from the extended output lines 974-1, 974-2,974-3. As such, for example, the extended input line 971-1 paired withthe extended output line 974-1 can be connected to one another by via979-1 through the dielectric material to enable reversal in a direction(e.g., around a 180 degree turnaround) of the oscillating MW current.For clarity, the vias 979-1, 979-2, 979-3 are illustrated as beingpositioned slightly inward from ends of the paired extended input linesand extended output lines 978-1, 978-2, 978-3, although embodiments arenot so limited.

As described herein, the input lines 952-1, 952-2, 952-3 shown in theview of ion trap die 966-1 and the output lines 947-1, 947-2, 947-3shown in the view of ion trap die 966-2 can be similar in size and/orposition so as to be vertically stacked (e.g., paired) to form MW rails941-1, 941-2, 941-3 that extend through the ion trap region 968 in theview of ion trap die 966-3. In some embodiments, the input conductinglines 969-1, 969-2, 969-3 for the input lines 952-1, 952-2, 952-3 can besimilar in size and/or position so as to be vertically stacked along atleast part of a length of the output conducting lines 972-1, 972-2,972-3 for the output lines 947-1, 947-2, 947-3, as shown at 976-1,976-2, 976-3 in ion trap die 966-3. Similar to the MW rails 941-1,941-2, 941-3, the input conducting lines 969-1, 969-2, 969-3 can beseparated (e.g., insulated) from the output conducting lines 972-1,972-2, 972-3 (e.g., by a dielectric material as described herein and asshown at 849, 1049, etc.) at least along the length that they arevertically stacked.

FIG. 10 illustrates another cross-sectional view of a portion of an iontrap in accordance with one or more embodiments of the presentdisclosure. The embodiment of the ion trap 1080 illustrated in FIG. 10can include components and positioning of components consistent withthose illustrated in FIGS. 4-9 in an ion trap region 1068 and in an iontrap die 1066, although embodiments are not so limited.

As such, the cross-sectional view of the ion trap 1080 shown in FIG. 10illustrates a cross-sectional view of input conducting lines 1069-1,1069-3 and associated components near the input connections (e.g., asshown at 970-1, 970-3 in FIG. 9) at the edge of the ion trap die 1066outside the double lines. The ion trap region shown at 1068 between thedouble lines is consistent with the top views of the ion traps shown inFIGS. 4-7 and the cross-sectional view of the ion trap shown in FIG. 8.As described in connection with FIG. 8, the cross-sectional view of theion trap region 1068 shown in FIG. 10 cuts through the positions of thesecond number of TSVs 1043-1, 1043-2 and the associated trenchcapacitors 1044-1, 1044-2, although, in some embodiments, DC electrodesmay not be present past the longitudinal ends of the sequences of DCelectrodes as shown at 750-1 and 750-2 in FIG. 7. The RF rails 1008-1,1008-2, the MW rails 1041-1, 1041-2, 1041-3, and/or the GND rail 1007,however, can extend through the cut line, as shown in FIG. 7.

As described in connection with FIG. 3, the substrate 1005 shown in FIG.10 in the ion trap region 1068, or elsewhere in the ion trap die 1066(e.g., associated with the input connections 970 and/or outputconnections 973 shown in FIG. 9), can be bonded to an interposer (e.g.,as shown at 332 in FIG. 3) with a plurality of bond pads 1034. The bondpads 1034 can be a conductive material (e.g., gold).

According to various embodiments of the present disclosure, an ion trapdie 1066 can be formed by fabricating (e.g., etching) a plurality of(e.g., three) trenches 1051-1, 1051-2, 1051-3 below a surface of asubstrate 1005 that each extends from an end of an ion trap die (e.g.,the edge of the ion trap die 966 shown in FIG. 9) through an ion trapregion 1068. In various embodiments, the ion trap region 1068 can beconfigured to trap at least one ion (e.g., as shown at 804 in FIG. 8).The trenches each can, in various embodiments, be fabricated into thesubstrate 1005 with a width in a range of from around 10 microns toaround 100 microns and a depth in a range of from around 20 microns toaround 200 microns. In various embodiments, the trenches can be extendedbeyond the ion trap region 1068 for, for example, extended input linesand extended output lines (e.g., as shown at 971 and 974, respectively,in FIG. 9).

Embodiments of the ion trap die 1066 can be formed by partially fillinga lower portion of the plurality of (e.g., each of three) trenches witha first conductive material (e.g., copper, among other conductivematerials described herein) to operate as output lines 1047-1, 1047-2,1047-3 and/or an output conducting line (e.g., as shown at 972 in FIG.9) for MW current that has traveled beyond the ion trap region 1068. Asdescribed herein, a dielectric material 1049 can be formed above thefirst conductive material.

A plurality of (e.g., three) input conducting lines 1069-1, 1069-2,1069-3 can be formed (e.g., fabricated from copper wire, among otherconductive materials described herein, with a diameter in a range offrom around 200 microns to around 800 microns) above the firstconductive material (and the dielectric material) and starting above thesubstrate at the end of the ion trap die 1066. Input conducting line1069-2 is not shown because it could be between the double lines in FIG.10 where the ion trap region 1068 is shown. Each input conducting linecan be configured to receive (e.g., from a pole of a source, such as amagnetron) a current (e.g., 0.1-1.0 amps) oscillating at a MW frequency(e.g., 0.1-100 gigahertz).

In various embodiments, a second conductive material 1083-1, 1083-2,1083-3 (e.g., copper, among other conductive materials described herein)can be used for separately connecting the plurality of (e.g., each ofthree) input conducting lines to an upper surface of the substrate 1005above the dielectric material 1049. Second conductive material 1083-2 isnot shown because it could be between the double lines in FIG. 10 wherethe ion trap region 1068 is shown. The second conductive material can beused to fill a remaining upper portion of the plurality of (e.g., eachof three) trenches 1051-1, 1051-2, 1051-3 to operate as input lines1052-1, 1052-2, 1052-3 for the MW current to the ion trap region 1068.The input conducting lines 1069-1, 1069-2, 1069-3 can, in someembodiments, be connected to the second conductive material 1083-1,1083-2, 1083-3 with a connecting material 1082 (e.g., solder, amongother connecting materials).

As described in connection with FIG. 9, embodiments of the ion trap die1066 can be formed by fabricating (e.g., etching) a via (e.g., as shownat 979 in FIG. 9) through the dielectric material 1049 proximate to atrench beyond the ion trap region 1068. For example, can at leastpartially intersect each extended trench for the paired extended inputlines and extended output lines shown at 978 in FIG. 9. Accordingly, apaired input line and output line (e.g., each of the paired extendedinput lines and extended output lines) can be connected to the via toenable reversal (e.g., a 180 degree reversal) in a direction of the MWcurrent. In various embodiments, reversal of the MW current can enablean output MW current to be connected to an opposite pole and/or a groundpole of the source.

In various embodiments, a third conductive material (e.g., copper, gold,and/or superconducting niobium, among other elements and/or alloys) canbe formed as a MW shield (e.g., as shown at 848 in FIG. 8) above anupper surface and/or below a lower surface of the first conductivematerial 1036 at least in the ion trap region 1068. The MW shield can,in various embodiments, have separate portions individually positionedbetween the MW rails and overlying and/or nearby sequences of DCelectrodes (e.g., as shown at 1006-1, 1006-2, etc.), RF rails (e.g., asshown at 1008-1, 1008-2, etc.), and/or GND rails (e.g., as shown at1007, etc.).

Embodiments of the ion trap die 1066 can be formed by reducing adiameter and/or a height above the surface of the substrate 1005 of theplurality of (e.g., each of three) input conducting lines 1069-1,1069-2, 1069-3 as the conducting lines transit from the end of the iontrap die 1066 to the ion trap region 1068 (e.g., as shown at 969 in FIG.9). So reducing the diameter and/or the height above the surface of thesubstrate 1005 can enable forming (e.g., leaving) paired input lines1052-1, 1052-2, 1052-3 and output lines 1047-1, 1047-2, 1047-2 in thetrenches (e.g., each of the three trenches) 1051-1, 1051-2, 1051-3 thatare below the planar first conductive material 1036 (and the surface ofthe substrate 1005) in the ion trap region 1068 to operate as aplurality of (e.g., three) MW rails 1041-1, 1041-2, 1041-3.

The embodiments are described in sufficient detail to enable those ofordinary skill in the art to practice one or more embodiments of thisdisclosure. It is to be understood that other embodiments may beutilized and that process, electrical, and/or structural changes may bemade without departing from the scope of the present disclosure. It isalso to be understood that the terminology used herein is for thepurpose of describing particular embodiments only, and is not intendedto be limiting.

As will be appreciated, elements shown in the various embodiments hereincan be added, exchanged, combined, and/or eliminated so as to provide anumber of additional embodiments of the present disclosure. Theproportion and/or the relative scale of the elements provided in thefigures are intended to illustrate the embodiments of the presentdisclosure, and should not be taken in a limiting sense.

As used herein, the singular forms “a”, “an”, and “the” include singularand plural referents, unless the context clearly dictates otherwise, asdo “a number of”, “at least one”, and “one or more”. For example, “anumber of ion locations” can refer to one or more ion locations.Furthermore, the words “can” and “may” are used throughout thisapplication in a permissive sense (i.e., having the potential to, beingable to), not in a mandatory sense (i.e., must). The term “include”, andderivations thereof, mean “including, but not limited to.” The term“die” is used herein to mean a block of semiconducting material (e.g.,electronic-grade silicon and/or another semiconductor) on which and/orin which a particular functionality (e.g., circuitry) can be fabricated.

Although specific embodiments have been illustrated and describedherein, those of ordinary skill in the art will appreciate that anarrangement calculated to achieve the same techniques can be substitutedfor the specific embodiments shown. This disclosure is intended to coverany and all adaptations and/or variations of various embodiments of thedisclosure.

It is to be understood that the above description has been made in anillustrative fashion, and not a restrictive one. Combination of theabove embodiments, and other embodiments not specifically describedherein will be apparent to those of skill in the art upon reviewing theabove description.

The scope of the various embodiments of the disclosure includes anyother applications in which the above structures and methods are used.In the foregoing Detailed Description, various features are groupedtogether in example embodiments illustrated in the figures for thepurpose of streamlining the disclosure.

This method of disclosure is not to be interpreted as reflecting anintention that the embodiments of the disclosure require more featuresthan are expressly recited in each claim. Rather, inventive subjectmatter lies in less than all features of a single disclosed embodiment.Therefore, the scope of various embodiments of the disclosure should bedetermined with reference to the appended claims, along with the fullrange of equivalents to which such claims are entitled.

What is claimed:
 1. An ion trap apparatus, comprising: a number ofmicrowave (MW) rails and a number of radio frequency (RF) rails formedwith substantially parallel longitudinal axes and with substantiallycoplanar upper surfaces; two sequences of direct current (DC) electrodeswith each sequence formed to extend substantially parallel to thesubstantially parallel longitudinal axes of the MW rails and the RFrails; a number of through-silicon vias (TSVs) formed through asubstrate of the ion trap; and a trench capacitor formed in thesubstrate around at least one TSV.
 2. The apparatus of claim 1, whereinthe two sequences of DC electrodes are configured to be biased with DCvoltages that contribute to a combined electrical field and magneticfield to trap at least one ion in a potential well above an uppersurface of at least one of the DC electrodes, the MW rails, and the RFrails.
 3. The apparatus of claim 1, wherein the number of RF rails areconfigured to conduct an oscillating current to contribute to a combinedelectrical field and magnetic field to trap at least one ion in apotential well above the DC electrodes, the MW rails and the RF rails.4. The apparatus of claim 1, wherein the number of MW rails areconfigured to conduct an oscillating current to contribute to transitionbetween quantum states of at least one ion in a potential well above theMW rails or the RF rails.
 5. The apparatus of claim 1, wherein thenumber of TSVs formed through the substrate are configured to provide anelectrical potential to DC electrodes in the two sequences of DCelectrodes.
 6. The apparatus of claim 1, wherein the trench capacitorformed in the substrate is configured with a capacitance to reduceunintended variation of an electrical field to which an associated DCelectrode contributes.
 7. The apparatus of claim 1, further comprising:a number of ground rails formed between the two sequences of DCelectrodes substantially parallel to the substantially parallellongitudinal axes of the two sequences of DC electrodes, the MW rails,and the RF rails; wherein the number of ground rails are configured toprovide a relatively stable location in a potential well for at leastone ion above an upper surface of the DC electrodes, the MW rails, theRF rails, and the ground rails.
 8. An ion trap system, comprising: asubstrate material; three sequential planar conductive materials formedabove the substrate material, wherein: a first planar conductivematerial forms a ground plane; a second planar conductive material formsa signal routing plane; and a third planar conductive material forms aground connection plane; a number of longitudinal gaps formed in thesecond planar conductive material to separate two longitudinal sequencesof direct current (DC) electrodes from at least two separatelongitudinal radio frequency (RF) rails positioned between the twosequences of DC electrodes; a first number of through-silicon vias(TSVs) formed through the substrate material; a first number of trenchcapacitors formed in the substrate material around at least one of thefirst number of TSVs; and at least two longitudinal microwave (MW) railsare positioned in the substrate below the first planar conductivematerial.
 9. The system of claim 8, wherein an electrical potential isprovided to a number of DC electrodes in the two longitudinal sequencesof DC electrodes by the DC electrodes being connected to the firstnumber of TSVs by the second planar conductive material.
 10. The systemof claim 8, wherein the two longitudinal sequences of DC electrodes areconnected to the first number of TSVs on an opposite side of thesubstrate from a source of an electrical potential connected to thefirst number of TSVs.
 11. The system of claim 8, wherein a number ofhorizontal gaps are formed in the two longitudinal sequences of DCelectrodes to form two longitudinal sequences of separate DC electrodes.12. The system of claim 8, further comprising: a second number of TSVsformed through the substrate material and connected to the second planarconductive material; and a second trench capacitor formed in thesubstrate material around at least one of the second number of TSVs;wherein the second number of TSVs are formed longitudinally proximate toat least one DC electrode at longitudinal ends of the sequences of DCelectrodes.
 13. The system of claim 12, wherein the second planarconductive material connected to the second number of TSVs is connectedby a number of vias to a longitudinal DC rotate rail formed from thethird planar conductive material to reduce unintended variation of anelectrical field to which the number of DC electrodes contributes. 14.The system of claim 8, wherein the number of longitudinal gaps areformed in the second planar conductive material to separate at least twolongitudinal microwave (MW) rails positioned between the twolongitudinal sequences of DC electrodes from the two longitudinalsequences of DC electrodes and the at least two RF rails.
 15. The systemof claim 8, wherein the number of longitudinal gaps are formed in thesecond planar conductive material to separate a longitudinal ground railpositioned between two RF rails from the two longitudinal sequences ofDC electrodes and the two RF rails.
 16. The system of claim 8, wherein:at least one of the longitudinal MW rails is formed to include an inputline for input of an oscillating MW current and an output line foroutput of the oscillating MW current; and the input line is positionedmore proximate to the first planar conductive material than the outputline.
 17. The system of claim 16, further comprising: a number of viasformed through a dielectric material that separates the input line andthe output line; and the input line and the output line connected to oneanother by a via through the dielectric material to enable reversal in adirection of the oscillating MW current.